Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applications, Hardback Book

Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applications Hardback

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology.

The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.

It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Available to Order - This title is available to order, with delivery expected within 2 weeks
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