Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363 Hardback
Edited by Bernard M. (Stevens Institute of Technology, New Jersey) Gallois, Woo Y. Lee, Michael A. Pickering
Part of the MRS Proceedings series
Hardback
- Information
Description
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
Information
-
Unavailable
- Format:Hardback
- Pages:283 pages, Worked examples or Exercises
- Publisher:Materials Research Society
- Publication Date:05/04/1995
- Category:
- ISBN:9781558992641
Information
-
Unavailable
- Format:Hardback
- Pages:283 pages, Worked examples or Exercises
- Publisher:Materials Research Society
- Publication Date:05/04/1995
- Category:
- ISBN:9781558992641
