Amorphous Silicon Technology 1995: Volume 377
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Defect and Impurity Engineered Semiconductors and Devices: Volume 378
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Strained Layer Epitaxy: Volume 379 : Materials, Processing, and Device Applications
John C. (AT&T Bell Laboratories, New Jersey) Bean
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Rapid Thermal and Integrated Processing IV: Volume 387
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Film Synthesis and Growth using Energetic Beams: Volume 388
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Modeling and Simulation of Thin-Film Processing: Volume 389
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Gallium Nitride and Related Materials: Volume 395
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Silicide Thin Films: Volume 402 : Fabrication, Properties and Applications
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Diagnostic Techniques for Semiconductor Materials Processing: Volume 406
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Eric D. Jones
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Compound Semiconductor Electronics and Photonics: Volume 421
S. J. (University of Florida) Pearton
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III-Nitride, SiC, and Diamond Materials for Electronic Devices: Volume 423
Charles D. Brandt
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Structure and Evolution of Surfaces: Volume 440
Robert C. (The Johns Hopkins University) Cammarata
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Thin Films - Structure and Morphology: Volume 441
Robert C. Cammarata
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Low-Dielectric Constant Materials II: Volume 443
Helmuth Treichel
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Amorphous and Crystalline Insulating Thin Films - 1996: Volume 446
Sorin Cristoloveanu
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Amorphous and Microcrystalline Silicon Technology - 1997: Volume 467
Michael (Xerox Palo Alto Research Center, Stanford University, C Hack
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Gallium Nitride and Related Materials II: Volume 468
C. R. (University of Florida) Abernathy
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Defects and Diffusion in Silicon Processing: Volume 469
Tomas Diaz de la (Lawrence Livermore National Laboratory, Calif Rubia
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Epitaxial Oxide Thin Films III: Volume 474
Chang-Beom (Duke University, North Carolina) Eom
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Science and Technology of Semiconductor Surface Preparation: Volume 477
Gregg S. Hagashi
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Nitride Semiconductors: Volume 482
F. A. (Xerox Palo Alto Research Center, Stanford University, Ca Ponce
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Semiconductor Process and Device Performance Modelling: Volume 490
Scott T. (Boston University) Dunham
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