Extreme Ultraviolet Lithography, Paperback / softback Book

Extreme Ultraviolet Lithography Paperback / softback

Part of the SPIE Press Monographs series

Paperback / softback

Available to Order - This title is available to order, with delivery expected within 2 weeks
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This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography.

Lithography costs, which have often influenced the areas of technical focus, are discussed.

Potential improvements to current EUV technology and extensions to future nodes are also covered.

Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.

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Available to Order - This title is available to order, with delivery expected within 2 weeks
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